Electrical properties of GeO2films
- 15 December 1980
- journal article
- research article
- Published by American Physical Society (APS) in Physical Review B
- Vol. 22 (12) , 6155-6161
- https://doi.org/10.1103/physrevb.22.6155
Abstract
Measurements have been made on thin films using Ge as the dielectric material and for thickness ranges from 130 to 2000 Å. These thin layers of Ge show a number of interesting electrical properties which include electroforming, voltage-controlled differential negative resistance, electroluminescence, electron-emission, and switching-memory effects. A theory is developed in terms of the growth and thermal rupture of many conducting filaments through the insulating layer to explain the observed voltage-controlled differential negative resistance, electron-emission, electroluminescence, and memory phenomena.
Keywords
This publication has 7 references indexed in Scilit:
- Memory switching in GeO2filmsInternational Journal of Electronics, 1979
- Further studies on thin film structures of metal-borosilicate glass-metalInternational Journal of Electronics, 1974
- A new filamentary model for voltage formed amorphous oxide filmsJournal of Non-Crystalline Solids, 1972
- Electrical properties of Al-SiOx-Ag thin film cathodesPhysica Status Solidi (a), 1972
- A model for filament growth and switching in amorphous oxide filmsJournal of Non-Crystalline Solids, 1970
- Electronic conduction through thin unsaturated oxide layersPhysics Letters A, 1967
- Forming process in evaporated SiO thin filmsPhilosophical Magazine, 1967