Atmospheric-Pressure Chemical Vapor Deposition of Group IVb Metal Phosphide Thin Films from Tetrakisdimethylamidometal Complexes and Cyclohexylphosphine
- 21 February 2004
- journal article
- research article
- Published by American Chemical Society (ACS) in Chemistry of Materials
- Vol. 16 (6) , 1120-1125
- https://doi.org/10.1021/cm031161f
Abstract
No abstract availableKeywords
This publication has 23 references indexed in Scilit:
- Titanium Phosphide Coatings from the Atmospheric Pressure Chemical Vapor Deposition of TiCl4 and RPH2 (R = t-Bu, Ph, CyHex)Chemistry of Materials, 2002
- Single-source CVD routes to titanium phosphideJ. Chem. Soc., Dalton Trans., 2002
- Binary and Ternary Transition-Metal Phosphides as HDN CatalystsJournal of Catalysis, 2001
- MOCVD of Chalcogenides, Pnictides, and Heterometallic Compounds from Single-Source Molecule PrecursorsChemical Vapor Deposition, 2000
- Self-Propagating Metathesis Routes to Metastable Group 4 PhosphidesInorganic Chemistry, 2000
- Titanium monophosphide (TiP) layers as potential diffusion barriersMicroelectronic Engineering, 1997
- Precursor for the Low-Temperature Deposition of Titanium Phosphide FilmsChemistry of Materials, 1995
- Chromium-phosphorus films deposited by the pyrolysis of an organometallic precursorThin Solid Films, 1991
- Corrosion stability of vapour-deposited transition metal phosphides at high temperatureJournal of the Less Common Metals, 1981
- Studies of Crystal Structures and Phase Relationships in the Ti-P System.Acta Chemica Scandinavica, 1967