Design And Fabrication Of Micro Mirror Supported By Electroplated Nickel Posts

Abstract
In this paper, a 100 x 100/spl mu/m/sup 2/ aluminum micro mirror is designed and fabricated using a thick photoresist as a sacrificial layer and as a mold for nickel electroplating. The micro mirror is composed of aluminum mirror plate, two nickel support posts, two aluminum hinges, two address electrodes, and two landing electrodes. The aluminum mirror plate, which is suppoerted by two nickel support posts, is overhung about 10/spl mu/m from the silicon substrate. We use thick photoresist to obtain 10/spl mu/m thick sacrificial layer and electroplate nickel to obtain 10/spl mu/mm height support post. The aluminum mirror plate is actuated like a seesaw by electrostatic force generated by electrostatic potential difference applied between the mirror plate and the address electrode. We use RIE (Reactive Ion Etching) to release the micro mirror plate from the silicon substrate finally.

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