The relationship between gate bias and hot-carrier-induced instabilities in buried- and surface-channel PMOSFETs
- 1 March 1988
- journal article
- Published by Institute of Electrical and Electronics Engineers (IEEE) in IEEE Transactions on Electron Devices
- Vol. 35 (3) , 320-324
- https://doi.org/10.1109/16.2458
Abstract
No abstract availableKeywords
This publication has 5 references indexed in Scilit:
- Hot-electron-induced punchthrough (HEIP) effect in submicrometer PMOSFET'sIEEE Transactions on Electron Devices, 1987
- Hot-carrier-induced degradation in p-channel LDD MOSFET'sIEEE Electron Device Letters, 1986
- Design tradeoffs between surface and buried-channel FET'sIEEE Transactions on Electron Devices, 1985
- Relationship between hot-electrons/Holes and degradation of p- and n-channel MOSFET'sIEEE Electron Device Letters, 1985
- Hot-electron aging in p-channel MOSFET's for VLSI CMOSIEEE Transactions on Electron Devices, 1984