Oxygen donor formation and oxygen precipitation in czochralski silicon due to heat treatment at 600 to 800 °c
- 16 August 1985
- journal article
- research article
- Published by Wiley in Physica Status Solidi (a)
- Vol. 90 (2) , K151-K156
- https://doi.org/10.1002/pssa.2210900254
Abstract
No abstract availableThis publication has 9 references indexed in Scilit:
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