Low temperature metal-organic chemical vapor deposition of aluminum nitride with nitrogen trifluoride as the nitrogen source
- 1 August 1990
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 189 (2) , L11-L14
- https://doi.org/10.1016/0040-6090(90)90469-t
Abstract
No abstract availableKeywords
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