UV Laser Processing of Semiconductor Devices
- 1 January 1986
- journal article
- Published by Springer Nature in MRS Proceedings
Abstract
No abstract availableKeywords
This publication has 23 references indexed in Scilit:
- Deposition of refractory metal films by rare-gas halide laser photodissociation of metal carbonylsJournal of Applied Physics, 1986
- Excimer laser etching of polymersJournal of Applied Physics, 1986
- Excimer laser projection lithography on a full-field scanning projection systemIEEE Electron Device Letters, 1986
- UV laser-generated fluorine atom etching of polycrystalline Si, Mo, and TiApplied Physics Letters, 1985
- Comparison of laser-initiated and thermal chemical vapor deposition of tungsten filmsApplied Physics Letters, 1984
- Photodeposition of aluminum oxide and aluminum thin filmsApplied Physics Letters, 1983
- Modeling of carrier mobility against carrier concentration in arsenic-, phosphorus-, and boron-doped siliconIEEE Transactions on Electron Devices, 1983
- Silicon Melt, Regrowth, and Amorphization Velocities During Pulsed Laser IrradiationPhysical Review Letters, 1983
- Cellular structure and silicide formation in laser-irradiated metal-silicon systemsApplied Physics Letters, 1979
- Thermal Conductivity of the ElementsJournal of Physical and Chemical Reference Data, 1972