Surface reaction and recombination of the SiH3 radical on hydrogenated amorphous silicon
- 23 February 1987
- journal article
- research article
- Published by AIP Publishing in Applied Physics Letters
- Vol. 50 (8) , 433-435
- https://doi.org/10.1063/1.98165
Abstract
Mercury photosensitized decomposition of SiH4 is used to study surface reactions of SiH3 on hydrogenated amorphous silicon (a‐Si:H). The method involves modeling of gas phase production, reaction and diffusion to the walls of reactive species, in a parallel plate reactor, combined with measurements of surface reflection coefficient of SiH3, spatial density profile of SiH3, and a‐Si:H deposition rate. The reaction probability of SiH3 on a‐Si:H varies from 0.1 up to 0.2 in the 40–350 °C temperature domain. However, a large fraction (≥60%) of adsorbed SiH3 recombine on the surface, instead of being incorporated in the film.Keywords
This publication has 15 references indexed in Scilit:
- Film formation mechanisms in the plasma deposition of hydrogenated amorphous siliconJournal of Applied Physics, 1986
- High rate photochemical deposition of amorphous silicon from higher silanesJournal of Non-Crystalline Solids, 1985
- Preparation of highly photosensitive hydrogenated amorphous Si-Ge alloys using a triode plasma reactorApplied Physics Letters, 1985
- Photochemical vapor deposition of amorphous silicon through 185 nm excitation of monosilaneJournal of Non-Crystalline Solids, 1983
- Lifetime of dominant radicals for the deposition of a-Si:H from SiH4 and Si2H6 glow dischargesJournal of Non-Crystalline Solids, 1983
- Hydrogen-atom initiated decomposition of monosilaneThe Journal of Physical Chemistry, 1976
- Reaction mechanism in chemisorption kinetics: nitrogen on the {100} plane of tungstenProceedings of the Royal Society of London. Series A. Mathematical and Physical Sciences, 1974
- Arrhenius parameters for silene insertion reactionsJournal of the Chemical Society, Faraday Transactions 1: Physical Chemistry in Condensed Phases, 1973
- Rate of combination of trimethylsilyl radicals in the gas phaseJournal of the Chemical Society, Faraday Transactions 1: Physical Chemistry in Condensed Phases, 1972
- Mass spectrometric study of the mercury-photosensitized reactions of silane and methylsilane with nitric oxideThe Journal of Physical Chemistry, 1970