Langmuir diagnostics of an rf-magnetron discharge used for ion-assisted growth of PbTe epilayers
- 15 August 1990
- journal article
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 68 (4) , 1635-1640
- https://doi.org/10.1063/1.346644
Abstract
The plasma potential and the electron density and electron temperature of an rf magnetron discharge used for the ion-assisted growth of PbTe epilayers on BaF2 are measured using Langmuir probe diagnostics. The effect of rf potentials at the probe on the measured plasma parameters is reduced by driving the probe to follow the plasma potential. The discharge parameters are determined as a function of substrate bias voltage and substrate rf power. The ion energy and flux necessary for the epitaxial growth of (111) PbTe on (111) BaF2 are determined.This publication has 27 references indexed in Scilit:
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