Nanomechanical characterization of multilayered thin film structures for digital micromirror devices
- 31 August 2004
- journal article
- Published by Elsevier in Ultramicroscopy
- Vol. 100 (3-4) , 375-389
- https://doi.org/10.1016/j.ultramic.2003.11.015
Abstract
No abstract availableKeywords
This publication has 20 references indexed in Scilit:
- A comparative study on reactive and non-reactive unbalanced magnetron sputter deposition of TiN coatingsPublished by Elsevier ,2002
- Surface oxidation of a Nb(100) single crystal by scanning tunneling microscopyMaterials Characterization, 2002
- The DMDTM Projection Display Chip: A MEMS-Based TechnologyMRS Bulletin, 2001
- Comparison study of physical vapor-deposited and chemical vapor-deposited titanium nitride thin films using X-ray photoelectron spectroscopyApplied Surface Science, 2000
- Micromechanical properties of amorphous carbon coatings deposited by different deposition techniquesThin Solid Films, 1995
- Stress variation with temperature/time and its correlation to film structure and deposition parametersJournal of Vacuum Science & Technology A, 1991
- Surface reactivity of titanium–aluminum alloys: Ti3Al, TiAl, and TiAl3Journal of Vacuum Science & Technology A, 1991
- Effect of residual stress and adhesion on the hardness of copper films deposited on siliconJournal of Materials Research, 1990
- Stress-related effects in thin filmsThin Solid Films, 1989
- Variation of Hardness of Metals with Grain SizeNature, 1954