Optimization of transient temperature uniformity in RTP systems
Open Access
- 1 January 1992
- journal article
- Published by Institute of Electrical and Electronics Engineers (IEEE) in IEEE Transactions on Electron Devices
- Vol. 39 (1) , 205-207
- https://doi.org/10.1109/16.108233
Abstract
No abstract availableKeywords
This publication has 5 references indexed in Scilit:
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- Improvement of Temperature Uniformity in Rapid Thermal Processing Systems Using Multivariable ControlMRS Proceedings, 1991
- Steady-state thermal uniformity and gas flow patterns in a rapid thermal processing chamberIEEE Transactions on Semiconductor Manufacturing, 1991
- The appearance of spatially nonuniform temperature distributions during rapid thermal processingApplied Physics A, 1991
- Thermal and stress analysis of semiconductor wafers in a rapid thermal processing ovenIEEE Transactions on Semiconductor Manufacturing, 1988