Micro-Mechanical Characterization of Tantalum Nitride Thin Films on Sapphire Substrates
- 1 January 1994
- journal article
- Published by Springer Nature in MRS Proceedings
Abstract
No abstract availableKeywords
This publication has 16 references indexed in Scilit:
- Microscratch analysis of the work of adhesion for Pt thin films on NiOJournal of Materials Research, 1992
- Microscratch and load relaxation tests for ultra-thin filmsJournal of Materials Research, 1991
- Stability of tantalum nitride thin film resistorsJournal of Materials Research, 1990
- The use of scratch adhesion testing for the determination of interfacial adhesion: The importance of frictional dragSurface and Coatings Technology, 1988
- Contact MechanicsJournal of Tribology, 1986
- A method for interpreting the data from depth-sensing indentation instrumentsJournal of Materials Research, 1986
- An energy approach to the adhesion of coatings using the scratch testThin Solid Films, 1984
- A study of the oxidation of tantalum nitride by ellipsometry and auger electron spectroscopySurface Science, 1976
- Measurement of adhesion by a blister methodJournal of Applied Polymer Science, 1961
- Measurement of adhesion of thin filmsProceedings of the Royal Society of London. Series A. Mathematical and Physical Sciences, 1960