Scanning X-ray interferometry over a millimeter baseline
- 1 April 1997
- journal article
- Published by Institute of Electrical and Electronics Engineers (IEEE) in IEEE Transactions on Instrumentation and Measurement
- Vol. 46 (2) , 576-579
- https://doi.org/10.1109/19.571920
Abstract
A new translation device has been developed at the Istituto di Metrologia ''G. Colonnetti'' (IMGC) to improve the measurement of the (220) lattice spacing in silicon by X-ray/optical interferometry, It is capable of millimeter linear displacement and servo controls ensure picometer and nanoradian resolutions in crystal position and attitude, It has been successfully used to drive a scanning X-ray interferometer over a 2 mm displacement, thus extending by more than one order of magnitude the maximum crystal movement obtained beforeKeywords
This publication has 12 references indexed in Scilit:
- Absolute Measurement of Lattice Spacing d(220) in Floating Zone Silicon CrystalJapanese Journal of Applied Physics, 1995
- Measurement of the silicon (220) lattice spacingPhysical Review Letters, 1994
- A displacement and angle interferometer with subatomic resolutionReview of Scientific Instruments, 1993
- Accuracy assessment of a least-squares estimator for scanning X-ray interferometryMeasurement Science and Technology, 1991
- Silicon lattice constant: limits in IMGC X-ray/optical interferometryIEEE Transactions on Instrumentation and Measurement, 1991
- Phase Modulation in High-resolution Optical InterferometryMetrologia, 1991
- Non-Linear Analysis of the Elastic Behaviour of a Translation Device for X-Ray InterferometryMetrologia, 1989
- Translation stage for a scanning x-ray optical interferometerReview of Scientific Instruments, 1987
- On the Construction of a Zerodur Translation Device for X-Ray Interferometric ScanningMetrologia, 1986
- Absolute Measurement of the (220) Lattice Plane Spacing in a Silicon CrystalPhysical Review Letters, 1981