Distributed ECR Plasma Sources
- 1 January 1995
- book chapter
- Published by Elsevier
Abstract
No abstract availableThis publication has 50 references indexed in Scilit:
- Multipole confined diffusion plasma produced by 13.56 MHz electrodeless sourceJournal of Vacuum Science & Technology A, 1989
- Microwave multipolar plasmas excited by distributed electron cyclotron resonance: Concept and performanceReview of Scientific Instruments, 1988
- A Parametric Study of the Etching of Silicon in SF6Microwave Multipolar Plasmas: Interpretation of Etching MechanismsJapanese Journal of Applied Physics, 1987
- Rf multipolar plasma for broad and reactive ion beamsVacuum, 1986
- Anisotropic etching of silicon using an SF6/Ar microwave multipolar plasmaJournal of Vacuum Science & Technology B, 1986
- Plasma etching in magnetic multipole microwave dischargeApplied Physics Letters, 1984
- Plasma etching with surface magnetic field confinementApplied Physics Letters, 1983
- Characteristics of a large-volume rf-grid discharge plasmaJournal of Applied Physics, 1976
- Magnetic Multipole Containment of Large Uniform Collisionless Quiescent PlasmasReview of Scientific Instruments, 1973
- Plasma confinement with spherical multipole magnetic fieldPhysics Letters A, 1967