Crystallization of amorphous thin low pressure chemical vapour deposition silicon films: in situ TEM measurement of grain growth rates
- 1 January 1993
- journal article
- Published by Springer Nature in Journal of Materials Science Letters
- Vol. 12 (12) , 910-912
- https://doi.org/10.1007/bf00455615
Abstract
No abstract availableThis publication has 11 references indexed in Scilit:
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