Three-dimensional resist process simulator PEACE (photo and electron beam lithography analyzing computer engineering system)
- 1 June 1991
- journal article
- Published by Institute of Electrical and Electronics Engineers (IEEE) in IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems
- Vol. 10 (6) , 802-807
- https://doi.org/10.1109/43.137508
Abstract
No abstract availableThis publication has 10 references indexed in Scilit:
- A Three-Dimensional Photoresist Imaging Process Simulator for Strong Standing-Wave Effect EnvironmentIEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems, 1987
- Process Modeling for Photoresist Development and Design of DLR/sd (Double-Layer Resist by a Single Development) ProcessIEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems, 1987
- Application of the simulator “XMAS” on specific problems in sub-half-micron lithographyMicroelectronic Engineering, 1985
- RD3D (computer simulation of resist development in three dimensions)IEEE Transactions on Electron Devices, 1981
- Partially coherent imaging in two dimensions and the theoretical limits of projection printing in microfabricationIEEE Transactions on Electron Devices, 1980
- A general simulator for VLSI lithography and etching processes: Part I—Application to projection lithographyIEEE Transactions on Electron Devices, 1979
- Line‐Profile resist development simulation techniquesPolymer Engineering & Science, 1977
- Monte Carlo simulation of spatially distributed beams in electron-beam lithographyJournal of Vacuum Science and Technology, 1975
- Modeling projection printing of positive photoresistsIEEE Transactions on Electron Devices, 1975
- Quantitative Electron Microprobe Analysis of Thin Films on SubstratesIBM Journal of Research and Development, 1974