Quantitative measurements of the mass distribution in thin films during electrotransport experiments
- 1 November 1972
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 13 (1) , 169-174
- https://doi.org/10.1016/0040-6090(72)90169-1
Abstract
No abstract availableThis publication has 15 references indexed in Scilit:
- HILLOCKS AS STRUCTURAL MARKERS FOR ELECTROMIGRATION RATE MEASUREMENTS IN THIN FILMSApplied Physics Letters, 1971
- Electromigration Damage of Grain-Boundary Triple Points in Al Thin FilmsJournal of Applied Physics, 1971
- ELECTROMIGRATION-INDUCED FAILURES IN ALUMINUM FILM CONDUCTORSApplied Physics Letters, 1970
- Dependence of Electromigration-Induced Failure Time on Length and Width of Aluminum Thin-Film ConductorsJournal of Applied Physics, 1970
- Electromigration Damage in Aluminum Film ConductorsJournal of Applied Physics, 1970
- ELECTROMIGRATION IN SINGLE-CRYSTAL ALUMINUM FILMSApplied Physics Letters, 1970
- Electromigration in Thin Al FilmsJournal of Applied Physics, 1969
- DIRECT TRANSMISSION ELECTRON MICROSCOPE OBSERVATION OF ELECTROTRANSPORT IN ALUMINUM THIN FILMSApplied Physics Letters, 1967
- ELECTROMIGRATION EFFECTS IN ALUMINUM FILM ON SILICON SUBSTRATESApplied Physics Letters, 1967
- SOME OBSERVATIONS ON THE ELECTROMIGRATION IN ALUMINUM FILMSApplied Physics Letters, 1967