Suitable precursor/solvent systems for laser-induced surface prenucleation
- 1 January 1992
- journal article
- Published by Elsevier in Applied Surface Science
- Vol. 54, 308-310
- https://doi.org/10.1016/0169-4332(92)90061-2
Abstract
No abstract availableKeywords
This publication has 19 references indexed in Scilit:
- Laser-induced chemical vapor deposition of aluminumApplied Physics Letters, 1989
- High-speed laser chemical vapor deposition of copper: A search for optimum conditionsJournal of Applied Physics, 1989
- Laser-driven chemical vapor deposition of platinum at atmospheric pressure and room temperature from C pPt(CH3)3Applied Physics Letters, 1988
- Laser direct writing of aluminum conductorsApplied Physics Letters, 1988
- Gas phase versus surface contributions to photolytic laser chemical vapor deposition ratesApplied Physics A, 1988
- Laser writing of copper lines from metalorganic filmsApplied Physics Letters, 1987
- Growth rates and electrical conductivity of microscopic ohmic contacts fabricated by laser chemical vapor deposition of platinumApplied Physics A, 1987
- Direct writing of metal conductors with near-uv lightApplied Physics B Laser and Optics, 1987
- Projection printing of gold micropatterns by photochemical decompositionApplied Physics Letters, 1986
- Laser chemical vapor deposition of copperApplied Physics Letters, 1985