Growth of Hafnium Dioxide Thin Films by Liquid‐Injection MOCVD Using Alkylamide and Hydroxylamide Precursors
- 12 December 2003
- journal article
- research article
- Published by Wiley in Chemical Vapor Deposition
- Vol. 9 (6) , 309-314
- https://doi.org/10.1002/cvde.200306271
Abstract
No abstract availableKeywords
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