A new selective MOVPE regrowth process utilizing in-situ vapor phase etching for optoelectronic integrated circuits
- 1 January 1991
- journal article
- Published by Elsevier in Journal of Crystal Growth
- Vol. 107 (1-4) , 767-771
- https://doi.org/10.1016/0022-0248(91)90555-j
Abstract
No abstract availableThis publication has 6 references indexed in Scilit:
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