Post-hydrogenation of CVD deposited a-Si films
- 29 February 1980
- journal article
- Published by Elsevier in Journal of Non-Crystalline Solids
- Vol. 35-36, 291-296
- https://doi.org/10.1016/0022-3093(80)90609-2
Abstract
No abstract availableKeywords
This publication has 5 references indexed in Scilit:
- Doping and annealing effects on ESR in chemically vapor deposited amorphous siliconSolid State Communications, 1979
- Hydrogenation of evaporated amorphous silicon films by plasma treatmentApplied Physics Letters, 1978
- A SIMS analysis of deuterium diffusion in hydrogenated amorphous siliconApplied Physics Letters, 1978
- Hydrogenation and dehydrogenation of amorphous and crystalline siliconApplied Physics Letters, 1978
- Doped amorphous semiconductorsAdvances in Physics, 1977