High-rate deposition of highly crystallized silicon films from inductively coupled plasma
- 1 July 2003
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 435 (1-2) , 39-43
- https://doi.org/10.1016/s0040-6090(03)00374-2
Abstract
No abstract availableThis publication has 9 references indexed in Scilit:
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