Zn-diffused In0.53Ga0.47As/InP avalanche photodetector

Abstract
Mesa In0.53Ga0.47As avalanche photodetectors were successfully fabricated by liquid‐phase‐epitaxial growth on (100) ‐InP substrate and Zn‐diffusion technique. An avalanche multiplication M as high as 32 was measured under broad‐area illumination provided by a cw InGaAsP laser at 1.3 μm. Distribution of M was measured by an electron‐beam‐induced current image of a scanning electron microscope, and uniform multiplication profiles were observed up to M=3 and M=12 at the mesa diameter of 300 and 150 μm, respectively.