Poly(aryline imide)s as E‐beam resist: Sensitivity and resolution
- 1 September 1989
- journal article
- Published by Wiley in Journal of Polymer Science Part A: Polymer Chemistry
- Vol. 27 (10) , 3343-3352
- https://doi.org/10.1002/pola.1989.080271013
Abstract
No abstract availableKeywords
This publication has 12 references indexed in Scilit:
- Radiolysis of poly(acetaldehyde‐co‐chloral): A positive E‐beam resistJournal of Polymer Science Part A: Polymer Chemistry, 1989
- Mechanistic study of radiation-induced depolymerization of poly(chloroacetaldehyde)Macromolecules, 1989
- Poly(arylsulfone imide) as E-beam resist: Synthesis and radiolysisJournal of Polymer Science Part A: Polymer Chemistry, 1989
- Radiolysis of resist polymers. VI. Copolymers of trihalophenylmethacrylate and methyl methacrylateJournal of Polymer Science: Polymer Chemistry Edition, 1985
- Radiolysis of resist polymers. 2. Poly(haloalkylmethacrylates) and copolymers with methyl methacrylateMacromolecules, 1984
- Radiolysis of resist polymers. 1. Poly(methyl α-haloacrylates) and copolymers with methyl methacrylateMacromolecules, 1984
- Radiolysis of resist polymers. III. Copolymers of methyl-α-chloroacrylate and trihaloethylmethacrylatesJournal of Polymer Science: Polymer Chemistry Edition, 1984
- Polyimide insulators for multilevel interconnectionsThin Solid Films, 1981
- Propagation/depropagation equilibrium and structural factors in the radiation degradation of poly(olefin sulfone)sJournal of Polymer Science: Polymer Chemistry Edition, 1981
- Electron irradiation of poly(olefin sulfones). Application to electron beam resistsJournal of Applied Polymer Science, 1973