AC Charge Centroid Model For Quantization Of Inversion Layer In N-MOSFET
- 24 August 2005
- conference paper
- Published by Institute of Electrical and Electronics Engineers (IEEE)
- No. 1524766X,p. 245-249
- https://doi.org/10.1109/vtsa.1997.614768
Abstract
No abstract availableKeywords
This publication has 7 references indexed in Scilit:
- Determination of ultra-thin gate oxide thicknesses for CMOS structures using quantum effectsPublished by Institute of Electrical and Electronics Engineers (IEEE) ,2002
- A physical compact MOSFET model, including quantum mechanical effects, for statistical circuit design applicationsPublished by Institute of Electrical and Electronics Engineers (IEEE) ,2002
- MOSFET carrier mobility model based on gate oxide thickness, threshold and gate voltagesSolid-State Electronics, 1996
- Quantization effects in inversion layers of PMOSFETs on Si (100) substratesIEEE Electron Device Letters, 1996
- Self-consistent calculation of electron and hole inversion charges at silicon–silicon dioxide interfacesJournal of Applied Physics, 1986
- Quantum properties of surface space-charge layersC R C Critical Reviews in Solid State Sciences, 1973
- Self-Consistent Results for-Type Si Inversion LayersPhysical Review B, 1972