H/sup +/ motion in SiO/sub 2/: incompatible results from hydrogen-annealing and radiation models
Open Access
- 1 December 1998
- journal article
- Published by Institute of Electrical and Electronics Engineers (IEEE) in IEEE Transactions on Nuclear Science
- Vol. 45 (6) , 2398-2407
- https://doi.org/10.1109/23.736460
Abstract
No abstract availableThis publication has 29 references indexed in Scilit:
- BOX quality as measured by hydrogen-anneal-induced positive charge transportPublished by Institute of Electrical and Electronics Engineers (IEEE) ,2002
- Positive charging of thermal SiO2/(100)Si interface by hydrogen annealingApplied Physics Letters, 1998
- Irradiation response of mobile protons in buried SiO/sub 2/ filmsIEEE Transactions on Nuclear Science, 1997
- Protonic nonvolatile field effect transistor memories in Si/SiO/sub 2//Si structuresIEEE Transactions on Nuclear Science, 1997
- Mechanism for anneal-induced interfacial charging in SiO2 thin films on SiApplied Physics Letters, 1996
- Reduction of hot electron degradation in metal oxide semiconductor transistors by deuterium processingApplied Physics Letters, 1996
- Passivation and depassivation of silicon dangling bonds at the Si/SiO2 interface by atomic hydrogenApplied Physics Letters, 1993
- Electron and hole trapping in irradiated SIMOX, ZMR and BESOI buried oxidesIEEE Transactions on Nuclear Science, 1992
- The time-dependence of post-irradiation interface trap build-up in deuterium-annealed oxides (n-MOSFET)IEEE Transactions on Nuclear Science, 1992
- The effect of high temperature hydrogen annealing on SOS filmsJournal of Crystal Growth, 1982