Challenges, developments and applications of silicon deep reactive ion etching
Top Cited Papers
- 1 June 2003
- journal article
- Published by Elsevier in Microelectronic Engineering
- Vol. 67-68, 349-355
- https://doi.org/10.1016/s0167-9317(03)00089-3
Abstract
No abstract availableThis publication has 9 references indexed in Scilit:
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