Direct Measurement of Surface Defect Level Distribution Associated with GaAs Antiphase Boundaries
- 18 January 1999
- journal article
- research article
- Published by American Physical Society (APS) in Physical Review Letters
- Vol. 82 (3) , 612-615
- https://doi.org/10.1103/physrevlett.82.612
Abstract
Using an electrostatic force microscope, we measure surface contact potential (SCP) variations across antiphase boundaries (APBs) on GaAs films grown on Ge substrates. The SCP at the APBs is consistently and reproducibly measured to be 30 mV higher than that at GaAs domains. This is due to Fermi levels being pinned at different surface states. The identical electrical behavior observed for all APBs indicates that they are the lowest energy orientation. The sign of observed Fermi level shift is consistent with a prevalence of Ga-Ga bonds at real APBs.
Keywords
This publication has 24 references indexed in Scilit:
- Scanning force microscopy studies of GaAs films grown on offcut Ge substratesJournal of Electronic Materials, 1998
- Anti-phase domain-free growth of GaAs on offcut (001) Ge wafers by molecular beam epitaxy with suppressed Ge outdiffusionJournal of Electronic Materials, 1998
- Properties and structure of antiphase boundaries in GaAs/Ge solar cellsMaterials Science and Engineering: B, 1996
- Influence of Ga vs As prelayers on GaAs/Ge growth morphologyJournal of Electronic Materials, 1996
- A closer study on the self-annihilation of antiphase boundaries in GaAs epilayersJournal of Crystal Growth, 1996
- Necessity of Ga prelayers in GaAs/Ge growth using gas-source molecular beam epitaxyApplied Physics Letters, 1994
- Polar-on-nonpolar epitaxyJournal of Crystal Growth, 1987
- Nucleation and growth of GaAs on Ge and the structure of antiphase boundariesJournal of Vacuum Science & Technology B, 1986
- Antiphase boundaries in GaAsApplied Physics Letters, 1985
- Some observations on Ge:GaAs(001) and GaAs:Ge(001) interfaces and filmsJournal of Vacuum Science & Technology B, 1983