In situ silicon-wafer temperature measurements during RF argon-ion plasma etching via fluoroptic thermometry
- 14 July 1987
- journal article
- Published by IOP Publishing in Journal of Physics D: Applied Physics
- Vol. 20 (7) , 889-896
- https://doi.org/10.1088/0022-3727/20/7/010
Abstract
No abstract availableKeywords
This publication has 6 references indexed in Scilit:
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