Ultraviolet–visible ellipsometry for process control during the etching of submicrometer features
- 1 March 1995
- journal article
- Published by Optica Publishing Group in Journal of the Optical Society of America A
- Vol. 12 (3) , 591-599
- https://doi.org/10.1364/josaa.12.000591
Abstract
Optics InfoBase is the Optical Society's online library for flagship journals, partnered and copublished journals, and recent proceedings from OSA conferences.Keywords
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