Evaluating ratio data for the determination of reduced thicknesses by XPS
- 1 August 1981
- journal article
- research article
- Published by Wiley in Surface and Interface Analysis
- Vol. 3 (4) , 149-152
- https://doi.org/10.1002/sia.740030402
Abstract
No abstract availableKeywords
This publication has 7 references indexed in Scilit:
- Determination of reduced thicknesses by means of the variable take-off angle techniqueJournal of Electron Spectroscopy and Related Phenomena, 1981
- Probing the influence of thin overlayers on the results of quantitative XPS analysis without reference samplesSurface and Interface Analysis, 1980
- Evaluation of XPS-data of oxide layersJournal of Electron Spectroscopy and Related Phenomena, 1979
- SiSiO2 interface characterization by ESCASurface Science, 1979
- Zur bestimmung der reduzierten dicke D/λ dünner Schichten mittels XPSJournal of Electron Spectroscopy and Related Phenomena, 1978
- X-Ray Photoelectron Spectroscopy of SiO2-Si Interfacial Regions: Ultrathin Oxide FilmsIBM Journal of Research and Development, 1978
- Solid state—and surface—analysis by means oF angular-dependent x-ray photoelectron spectroscopyProgress in Solid State Chemistry, 1976