Growth and characterization of silicon-nitride films by plasma-enhanced chemical vapor deposition
- 1 January 1991
- journal article
- Published by Elsevier in Applied Surface Science
- Vol. 48-49, 104-110
- https://doi.org/10.1016/0169-4332(91)90313-9
Abstract
No abstract availableThis publication has 20 references indexed in Scilit:
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