High quality In0.2Ga0.8As/AlxGa1−xAs (x=0−0.32) strained single quantum wells grown by molecular beam epitaxy
- 11 January 1993
- journal article
- research article
- Published by AIP Publishing in Applied Physics Letters
- Vol. 62 (2) , 190-192
- https://doi.org/10.1063/1.109339
Abstract
The effect of the Al composition on photoluminescence (PL) in the In0.2Ga0.8As/AlxGa1−xAs single strained quantum wells with the well width of 6 nm has been studied. The samples have been grown by molecular beam epitaxy. The PL intensity measured at RT very rapidly increases with the AlAs mole fraction possibly due to the suppression of the carrier leakage from a quantum well. It increases by a factor of 300 when the AlAs mole fraction x is increased from 0 to 0.32. The full width at half maximum of the PL spectrum measured at 10 K is as small as 3.0, 4.4, and 4.9 meV for x=0, 0.14, and 0.32, respectively. The increase in the PL linewidth can be explained by the increased effect of heterobarrier height on the quantized energy. The present results suggest that performance characteristics of devices can be improved by employing the high‐quality AlGaAs barrier instead of GaAs.Keywords
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