Optical and electrical properties of hydrogenated amorphous silicon films deposited by tetrode RF sputtering
- 31 July 1982
- journal article
- Published by Elsevier in Applications of Surface Science
- Vol. 11-12, 528-534
- https://doi.org/10.1016/0378-5963(82)90097-6
Abstract
No abstract availableKeywords
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