Tungsten silicide formation by multipulse excimer laser irradiation
- 1 May 1993
- journal article
- Published by Elsevier in Applied Surface Science
- Vol. 69 (1) , 345-349
- https://doi.org/10.1016/0169-4332(93)90531-f
Abstract
No abstract availableKeywords
This publication has 7 references indexed in Scilit:
- An experimental study of the influence of oxygen on silicide formation with tungsten deposited from tungsten hexafluorideJournal of Applied Physics, 1991
- The origin of stress in sputter-deposited tungsten films for x-ray masksJournal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 1991
- WSix refractory gate metal process for GaAs MESFETsSolid-State Electronics, 1990
- Investigation of chemically vapour deposited tungsten and tungsten silicide as contacts to n+ and p+ silicon areasThin Solid Films, 1990
- Pulsed laser synthesis of titanium silicides using a Q-Switched Nd: Glass laserApplied Physics A, 1989
- Laser synthesis of metal silicidesApplied Physics A, 1988
- Chromium silicide formation under pulsed heat flowThin Solid Films, 1986