Effects of r.f. bias and nitrogen flow rates on the reactive sputtering of TiA1N films
- 1 January 1997
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 293 (1-2) , 212-219
- https://doi.org/10.1016/s0040-6090(96)09038-4
Abstract
No abstract availableKeywords
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