Photothermal radiometric and spectroscopic measurements on silicon nitride thin films
- 15 December 1997
- journal article
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 82 (12) , 6215-6219
- https://doi.org/10.1063/1.366506
Abstract
Thin films of silicon nitride of various thicknesses, deposited by radio frequency magnetron sputtering on silicon quartz substrate, have been characterized by laser-induced and frequency scanned photothermal radiometry. Fourier transform infrared spectroscopy was also used to provide a qualitative description of the behavior of the films in the infrared range which shows favourable properties of these coatings to be used in passive cooling applications.This publication has 13 references indexed in Scilit:
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