Etching pits and dislocations in Si{111}
- 1 November 2000
- journal article
- Published by Elsevier in Sensors and Actuators A: Physical
- Vol. 86 (3) , 238-247
- https://doi.org/10.1016/s0924-4247(00)00458-1
Abstract
No abstract availableKeywords
This publication has 21 references indexed in Scilit:
- Micromachining of high-contrast optical waveguides in [111] silicon wafersIEEE Photonics Technology Letters, 2000
- The velocity source conceptJournal of Crystal Growth, 1999
- Velocity sources as an explanation for experimentally observed variations in Si{111} etch ratesJournal of Micromechanics and Microengineering, 1999
- Micromachined Photodiode Submount with Integrated Mirror for Efficient Out-of-Plane Coupling to Planar Polymeric Waveguide CircuitsJapanese Journal of Applied Physics, 1998
- Micromachining of plates in oriented siliconJournal of Micromechanics and Microengineering, 1998
- Silicon-micromachined scanning confocal optical microscopeJournal of Microelectromechanical Systems, 1998
- Surface quality of {111} side-walls in KOH-etched cavitiesSensors and Actuators A: Physical, 1997
- LPCVD silicon-rich silicon nitride films for applications in micromechanics, studied with statistical experimental design*Journal of Vacuum Science & Technology A, 1996
- Fabrication of 45° mirrors together with well-defined v-grooves using wet anisotropic etching of siliconJournal of Microelectromechanical Systems, 1995
- An Etch for Delineation of Defects in SiliconJournal of the Electrochemical Society, 1984