Characterization of interface traps in the subthreshold region of implanted 4H and 6H-SiC MOSFETs
- 1 October 2002
- journal article
- Published by Elsevier in Solid-State Electronics
- Vol. 46 (10) , 1579-1582
- https://doi.org/10.1016/s0038-1101(02)00108-9
Abstract
No abstract availableThis publication has 8 references indexed in Scilit:
- Effect of interface states on electron transport in 4H-SiC inversion layersIEEE Transactions on Electron Devices, 2001
- Anomalously High Density of Interface States Near the Conduction Band in SiO2/4H-SiC MOS DevicesMaterials Science Forum, 2000
- Interface trap profile near the band edges at the 4H-SiC/SiO2 interfaceApplied Physics Letters, 2000
- Characterization of inversion and accumulation layer electron transport in 4H and 6H-SiC MOSFETs on implanted P-type regionsIEEE Transactions on Electron Devices, 2000
- Interface States and Field-Effect Mobility in 6H-SiC MOS TransistorsMaterials Science Forum, 1998
- Modeling of transconductance degradation and extraction of threshold voltage in thin oxide MOSFET'sSolid-State Electronics, 1987
- Theory of the MOS transistor in weak inversion-new method to determine the number of surface statesIEEE Transactions on Electron Devices, 1975
- Surface states at steam-grown silicon-silicon dioxide interfacesIEEE Transactions on Electron Devices, 1966