Real-time monitoring and control of epitaxial semiconductor growth in a production environment by in situ spectroscopic ellipsometry
- 1 February 1998
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 313-314, 490-495
- https://doi.org/10.1016/s0040-6090(97)00870-5
Abstract
No abstract availableThis publication has 13 references indexed in Scilit:
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