Low temperature epitaxial growth of InP by remote plasma-assisted metalorganic chemical vapor deposition
- 1 May 1994
- journal article
- Published by Elsevier in Journal of Crystal Growth
- Vol. 139 (1-2) , 15-18
- https://doi.org/10.1016/0022-0248(94)90023-x
Abstract
No abstract availableKeywords
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