Electrical properties and structure of boron-doped sputter-deposited polycrystalline silicon films
- 1 July 1979
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 61 (1) , 105-113
- https://doi.org/10.1016/0040-6090(79)90506-6
Abstract
No abstract availableThis publication has 18 references indexed in Scilit:
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