Optimization of the deposition process of ZrN and TiN thin films on Si(1 0 0) using design of experiment method
- 28 September 2003
- journal article
- Published by Elsevier in Materials Chemistry and Physics
- Vol. 82 (1) , 228-236
- https://doi.org/10.1016/s0254-0584(03)00209-8
Abstract
No abstract availableKeywords
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