Low temperature photoluminescence properties of InGaN films grown on (0 1 2) Al2O3 and (0 0 0 1) Al2O3 substrates by low pressure MOVPE
- 31 May 1997
- journal article
- Published by Elsevier in Solid State Communications
- Vol. 102 (5) , 405-408
- https://doi.org/10.1016/s0038-1098(97)00006-9
Abstract
No abstract availableKeywords
This publication has 11 references indexed in Scilit:
- Identification of optical transitions in cubic and hexagonal GaN by spatially resolved cathodoluminescencePhysical Review B, 1996
- InGaN-Based Multi-Quantum-Well-Structure Laser DiodesJapanese Journal of Applied Physics, 1996
- On p-type doping in GaN—acceptor binding energiesApplied Physics Letters, 1995
- High-Brightness InGaN Blue, Green and Yellow Light-Emitting Diodes with Quantum Well StructuresJapanese Journal of Applied Physics, 1995
- Zn-doped InGaN growth and InGaN/AlGaN double-heterostructure blue-light-emitting diodesJournal of Crystal Growth, 1994
- Photoluminescence of InGaN films grown at high temperature by metalorganic vapor phase epitaxyApplied Physics Letters, 1991
- Growth and Luminescence Properties of Mg‐Doped GaN Prepared by MOVPEJournal of the Electrochemical Society, 1990
- Time-resolved spectroscopy of Zn- and Cd-doped GaNJournal of Applied Physics, 1987
- Preparation and optical properties of Ga1−xInxN thin filmsJournal of Applied Physics, 1975
- Luminescence in epitaxial GaN : CdJournal of Applied Physics, 1974