Initial growth mode of Er silicide on Si(111) by solid phase epitaxy
- 15 May 1996
- journal article
- Published by Elsevier in Surface Science
- Vol. 352-354, 622-627
- https://doi.org/10.1016/0039-6028(95)01216-8
Abstract
No abstract availableKeywords
This publication has 14 references indexed in Scilit:
- Surface reconstruction of(0001) investigated by scanning tunneling microscopyPhysical Review B, 1995
- Interfacial structure of two-dimensional epitaxial Er silicide on Si(111)Physical Review B, 1994
- Electronic structure of erbium suicide ultra-thin filmsSurface Science, 1993
- The growth of epitaxial Yb silicide: a study with STMSurface Science, 1993
- Electronic structure and interfacial geometry of epitaxial two-dimensional Er silicide on Si(111)Physical Review B, 1993
- Infrared response of Pt/Si/ErSi1.7 heterostructure: Tunable internal photoemission sensorApplied Physics Letters, 1992
- Fabrication and structure of epitaxial Er silicide films on (111) SiApplied Physics Letters, 1989
- Epitaxial growth of rare-earth silicides on (111) SiApplied Physics Letters, 1986
- The Schottky-barrier height of the contacts between some rare-earth metals (and silicides) and p-type siliconApplied Physics Letters, 1981
- Low Schottky barrier of rare-earth silicide on n-SiApplied Physics Letters, 1981