Band offset of GaAs-GaInP heterojunctions

Abstract
N+-GaAs/n-GaInP lattice-matched heterostructures, grown by metalorganic vapour phase epitaxy, have been studied by capacitance-voltage, current-voltage and current-temperature techniques. This allowed the determination of the conduction band offset in three different and independent ways. The value obtained (0.24-0.25 eV) has been verified by photoluminescence and photoluminescence excitation on a 90 AA thick GaAs well in GaInP grown under the same conditions.