On the mechanism of hillocks formation in vapour deposited thin films
- 1 August 1980
- journal article
- Published by Springer Nature in Acta Physica Academiae Scientiarum Hungaricae
- Vol. 49 (1-3) , 237-251
- https://doi.org/10.1007/bf03158754
Abstract
No abstract availableKeywords
This publication has 17 references indexed in Scilit:
- Formation of aluminium thin films in the presence of oxygen and nickelPhysica Status Solidi (a), 1979
- The temperature dependence of stresses in aluminum films on oxidized silicon substratesThin Solid Films, 1978
- Metallization in microelectronicsThin Solid Films, 1977
- High‐rate sputtering of aluminum for metallization of integrated circuitsJournal of Vacuum Science and Technology, 1977
- Purity and morphology of aluminium filmsThin Solid Films, 1975
- Aluminum alloy film deposition and characterizationThin Solid Films, 1974
- Hillock Growth on Vacuum Deposited Aluminum FilmsJournal of Vacuum Science and Technology, 1972
- Hillock-free aluminum thin films for electronic devicesMetallurgical Transactions, 1971
- Aluminum films deposited by rf sputteringMetallurgical Transactions, 1970
- Scanning Electron Microscopy of Graphite Growth in Iron and Nickel AlloysJournal of Applied Physics, 1966