X-ray photoelectron spectroscopy of thermal thin Ta2O5 films on Si
- 1 September 1998
- journal article
- Published by Elsevier in Applied Surface Science
- Vol. 135 (1-4) , 71-82
- https://doi.org/10.1016/s0169-4332(98)00278-5
Abstract
No abstract availableKeywords
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