High-frequency submicrometer Al/sub 0.48/In/sub 0.52/As/In/sub 0.53/Ga/sub 0.47/As heterostructure bipolar transistors
- 1 August 1989
- journal article
- Published by Institute of Electrical and Electronics Engineers (IEEE) in IEEE Electron Device Letters
- Vol. 10 (8) , 391-393
- https://doi.org/10.1109/55.31767
Abstract
The high speed scaling of an Al/sub 0.48/In/sub 0.52/As/In/sub 0.53/Ga/sub 0.47/As submicrometer heterostructure bipolar transistor (HBT) is presented. Transistors with emitter dimensions of 0.5*11 and 3.5*3.5 mu m/sup 2/ exhibit unity current-gain cutoff frequencies of 63 and 70 GHz, respectively. Emitter current density greater than 3.3*10/sup 5/ A/cm/sup 2/ is demonstrated in a submicrometer AlInAs/InGaAs HBT. The analysis shows that the device speed is limited by the parasitic collector charging time.Keywords
This publication has 8 references indexed in Scilit:
- Near-ideal lateral scaling in abrupt Al0.48In0.52As/In0.53Ga0.47As heterostructure bipolar transistors prepared by molecular beam epitaxyApplied Physics Letters, 1989
- Hot-electron InGaAs/InP heterostructure bipolar transistors with f/sub T/ of 110 GHzIEEE Electron Device Letters, 1989
- High-current-gain submicrometer InGaAs/InP heterostructure bipolar transistorsIEEE Electron Device Letters, 1988
- High-speed InAlAs/InGaAs heterojunction bipolar transistorsIEEE Electron Device Letters, 1988
- Heterojunction bipolar transistors for microwave and millimeter-wave integrated circuitsIEEE Transactions on Electron Devices, 1987
- High-speed frequency dividers using self-aligned AlGaAs/GaAs heterojunction bipolar transistorsIEEE Electron Device Letters, 1987
- A 30-ps Si bipolar IC using super self-aligned process technologyIEEE Transactions on Electron Devices, 1986
- Measurement of the conduction-band discontinuity of molecular beam epitaxial grown In0.52Al0.48As/In0.53Ga0.47As, N-n heterojunction by C-V profilingApplied Physics Letters, 1983