Donor-related deep levels in heavily Se-doped AlxGa1−xAs
- 1 February 1991
- journal article
- research article
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 69 (3) , 1429-1434
- https://doi.org/10.1063/1.347283
Abstract
The effects of donor‐related deep levels on the doping characteristic and photoluminescence in Se‐doped AlGaAs grown by metalorganic chemical vapor deposition have been studied. The net donor concentration has been observed to increase in proportion to doping in GaAs and Al0.4Ga0.6As, showing a cube‐root dependence in Al0.1Ga0.9As in the high doping concentration range. In a photoluminescence study, the emission due to self‐activated (SA) centers, which are complexes comprising a donor atom and a group‐III vacancy, was observed in Al0.1Ga0.9As with a stronger intensity than in GaAs. It is therefore suggested that more serious compensation in Al0.1Ga0.9As than in GaAs by SA centers is responsible for the early beginning of the cube‐root dependence in Al0.1Ga0.9As. In addition, the emission energy of SA centers was studied as a function of the carrier concentration; the observation of a Burstein–Moss shift in the SA emission energy reveals that it is due to a band‐to‐acceptor transition. In the case of Al0.4Ga0.6As, since no SA emission was observed, the linear increase in the net donor concentration up to high density has been interpreted as being the result of the absence of SA centers. The mechanism which suppresses the formation of SA centers in Al0.4Ga0.6As is discussed in conjunction with DX centers. A new luminescence band associated with DX centers was observed in Al0.4Ga0.6As; its emission mechanism is also discussed.This publication has 26 references indexed in Scilit:
- Photoluminescence transients due to hole capture at DX centers in As:SiPhysical Review Letters, 1989
- Optically detected magnetic resonance from the DX centre in silicon-doped AlxGa1-xAsJournal of Physics C: Solid State Physics, 1988
- Chloride VPE of AlxGa1-xAs by the Hydrogen Reduction Method Using a Metal Al SourceJapanese Journal of Applied Physics, 1988
- Electron Localization by a Metastable Donor Level in: A New Mechanism Limiting the Free-Carrier DensityPhysical Review Letters, 1988
- Investigation of theDXcenter in heavily dopedn-GaAsPhysical Review Letters, 1987
- Annealing effect in Si-doped GaAs and AlGaAs layers grown by MBEElectronics Letters, 1986
- Observation of the Persistent Photoconductivity Due to the DX Center in GaAs under Hydrostatic PressureJapanese Journal of Applied Physics, 1985
- Direct Evidence for the DX Center Being a Substitutional Donor in AlGaAs Alloy SystemJapanese Journal of Applied Physics, 1985
- Donor Levels in Si-Doped AlGaAs Grown by MBEJapanese Journal of Applied Physics, 1984
- Pressure and compositional dependences of the Hall coefficient inand their significancePhysical Review B, 1980